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ADVANCED ETCH TECHNOLOGY AND PROCESS INTEGRATION FOR NANOPATTERNING XI
- Item #:
- 066165
- UPC:
Details
-
Title:
Advanced Etch Technology and Process Integration for Nanopatterning XI
-
Subtitle:
At SPIE Advanced Lithography + Patterning
-
Date/Location:
Held 24-28 April 2022, San Jose, California, USA; and 23-27 May 2022 Online.
-
Series:
Proceedings of SPIE Volume 12056
-
Editor:
Bannister, Julie
-
ISBN:
9781510649873
-
Pages:
126 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Feb 2023 )
-
Title:
Advanced Etch Technology and Process Integration for Nanopatterning XI
-
Subtitle:
At SPIE Advanced Lithography + Patterning
-
Date/Location:
Held 24-28 April 2022, San Jose, California, USA; and 23-27 May 2022 Online.
-
Series:
Proceedings of SPIE Volume 12056
-
Editor:
Bannister, Julie
-
ISBN:
9781510649873
-
Pages:
126 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Feb 2023 )