NOVEL PATTERNING TECHNOLOGIES FOR SEMICONDUCTORS, MEMS/NEMS, AND MOEMS 2019

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049333

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Title: Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
Subtitle: At SPIE Advanced Lithography
Date/Location: Held 25-28 February 2019, San Jose, California, USA.
Series: Proceedings of SPIE Volume 10958
Editor: Sanchez, Martha I.
ISBN: 9781510625631
Pages: 246 (1 Vol)
Format: Softcover
TOC Link: View Table of Contents
Publisher: SPIE - International Society for Optics and Photonics
POD Publisher: Curran Associates, Inc. ( Jul 2019 )

Title: Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
Subtitle: At SPIE Advanced Lithography
Date/Location: Held 25-28 February 2019, San Jose, California, USA.
Series: Proceedings of SPIE Volume 10958
Editor: Sanchez, Martha I.
ISBN: 9781510625631
Pages: 246 (1 Vol)
Format: Softcover
TOC Link: View Table of Contents
Publisher: SPIE - International Society for Optics and Photonics
POD Publisher: Curran Associates, Inc. ( Jul 2019 )