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PHOTOMASK JAPAN 2017: XXIV SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY
- Item #:
- 046636
- UPC:
Details
-
Title:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
-
Date/Location:
Held 5-7 April 2017, Yokohama, Japan.
-
Series:
Proceedings of SPIE Volume 10454
-
Editor:
Takehisa, Kiwamu
-
ISBN:
9781510613898
-
Pages:
264 (1 Vol) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Aug 2017 )
-
Title:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
-
Date/Location:
Held 5-7 April 2017, Yokohama, Japan.
-
Series:
Proceedings of SPIE Volume 10454
-
Editor:
Takehisa, Kiwamu
-
ISBN:
9781510613898
-
Pages:
264 (1 Vol) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Aug 2017 )