PHOTOMASK TECHNOLOGY

PHOTOMASK TECHNOLOGY

Item #:
046633
Our Price: $120.00
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Details

  • Title: Photomask Technology
  • Subtitle: At SPIE Photomask Technology and EUV Lithography
  • Date/Location: Held 11-14 September 2017, Monterey, California, USA.
  • Series: Proceedings of SPIE Volume 10451
  • Editor: Buck, Peter
  • ISBN: 9781510613768
  • Pages: 446 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Dec 2017 )

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Tab 4

 
  • Title: Photomask Technology
  • Subtitle: At SPIE Photomask Technology and EUV Lithography
  • Date/Location: Held 11-14 September 2017, Monterey, California, USA.
  • Series: Proceedings of SPIE Volume 10451
  • Editor: Buck, Peter
  • ISBN: 9781510613768
  • Pages: 446 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Dec 2017 )