ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VI

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VI

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046399
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Details

  • Title: Advanced Etch Technology for Nanopatterning VI
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 27 February - 1 March 2017, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 10149
  • Editor: Engelmann, Sebastian U.
  • ISBN: 9781510607491
  • Pages: 196 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( May 2017 )

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  • Title: Advanced Etch Technology for Nanopatterning VI
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 27 February - 1 March 2017, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 10149
  • Editor: Engelmann, Sebastian U.
  • ISBN: 9781510607491
  • Pages: 196 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( May 2017 )