PHOTOMASK JAPAN 2016: XXIII SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY

PHOTOMASK JAPAN 2016: XXIII SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY

Item #:
046236
Our Price: $70.00
Adding to cart… The item has been added

Details

  • Title: Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
  • Date/Location: Held 6-8 April 2016, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 9984
  • Editor: Yoshioka, Nobuyuki
  • ISBN: 9781510603721
  • Pages: 240 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Sep 2016 )

Description

 

Members/Attendees

 

Tab 4

 
  • Title: Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
  • Date/Location: Held 6-8 April 2016, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 9984
  • Editor: Yoshioka, Nobuyuki
  • ISBN: 9781510603721
  • Pages: 240 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Sep 2016 )