ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING IV

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING IV

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045684
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Details

  • Title: Advanced Etch Technology for Nanopatterning IV
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 23-25 February 2015, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 9428
  • Editor: Lin, Qinghuang
  • ISBN: 9781628415308
  • Pages: 182 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2015 )

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  • Title: Advanced Etch Technology for Nanopatterning IV
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 23-25 February 2015, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 9428
  • Editor: Lin, Qinghuang
  • ISBN: 9781628415308
  • Pages: 182 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2015 )