PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XXI

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XXI

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045512
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Details

  • Title: Photomask and Next-Generation Lithography Mask Technology XXI
  • Subtitle: At Photomask Japan 2014
  • Date/Location: Held 15-16 April 2014, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 9256
  • ISBN: 9781628413236
  • Pages: 278 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jul 2014 )

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  • Title: Photomask and Next-Generation Lithography Mask Technology XXI
  • Subtitle: At Photomask Japan 2014
  • Date/Location: Held 15-16 April 2014, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 9256
  • ISBN: 9781628413236
  • Pages: 278 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jul 2014 )