ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING III

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING III

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045310
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Details

  • Title: Advanced Etch Technology for Nanopatterning III
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 24-25 February 2014, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 9054
  • Editor: Oehrlein, Gottlieb S.
  • ISBN: 9780819499776
  • Pages: 188 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2014 )

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Tab 4

 
  • Title: Advanced Etch Technology for Nanopatterning III
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 24-25 February 2014, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 9054
  • Editor: Oehrlein, Gottlieb S.
  • ISBN: 9780819499776
  • Pages: 188 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2014 )