PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XX

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XX

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044957
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Details

  • Title: Photomask and Next-Generation Lithography Mask Technology XX
  • Date/Location: Held 16-19 April 2013, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 8701
  • Editor: Miyamoto, Junko
  • ISBN: 9780819494917
  • Pages: 378 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jul 2013 )

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  • Title: Photomask and Next-Generation Lithography Mask Technology XX
  • Date/Location: Held 16-19 April 2013, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 8701
  • Editor: Miyamoto, Junko
  • ISBN: 9780819494917
  • Pages: 378 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jul 2013 )