ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING II

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING II

Item #:
044941
Our Price: $70.00
Adding to cart… The item has been added

Details

  • Title: Advanced Etch Technology for Nanopatterning II
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 25-27 February 2013, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 8685
  • Editor: Zhang, Ying
  • ISBN: 9780819494672
  • Pages: 220 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2013 )

Description

 

Members/Attendees

 

Tab 4

 
  • Title: Advanced Etch Technology for Nanopatterning II
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 25-27 February 2013, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 8685
  • Editor: Zhang, Ying
  • ISBN: 9780819494672
  • Pages: 220 (1 Vol)
  • Format: Softcover
  • TOC Link: View Table of Contents
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2013 )