PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIX

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIX

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044697
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  • Title: Photomask and Next-Generation Lithography Mask Technology XIX
  • Subtitle: At Photomask and NGL Mask Technology XIX
  • Date/Location: Held 17-19 April 2012, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 8441
  • Editor: Miyamoto, Junko
  • ISBN: 9780819491367
  • Pages: 520 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jun 2012 )

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  • Title: Photomask and Next-Generation Lithography Mask Technology XIX
  • Subtitle: At Photomask and NGL Mask Technology XIX
  • Date/Location: Held 17-19 April 2012, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 8441
  • Editor: Miyamoto, Junko
  • ISBN: 9780819491367
  • Pages: 520 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jun 2012 )