ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING

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044584
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Details

  • Title: Advanced Etch Technology for Nanopatterning
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 13-14 February 2012, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 8328
  • Editor: Zhang, Ying
  • ISBN: 9780819489845
  • Pages: 224 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2012 )

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  • Title: Advanced Etch Technology for Nanopatterning
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 13-14 February 2012, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 8328
  • Editor: Zhang, Ying
  • ISBN: 9780819489845
  • Pages: 224 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2012 )