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ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIX
- Item #:
- 044581
- UPC:
Details
-
Title:
Advances in Resist Materials and Processing Technology XXIX
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 13-15 February 2012, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 8325
-
Editor:
Somervell, Mark H.
-
ISBN:
9780819489814
-
Pages:
686 (1 Vol) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Apr 2012 )
-
Title:
Advances in Resist Materials and Processing Technology XXIX
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 13-15 February 2012, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 8325
-
Editor:
Somervell, Mark H.
-
ISBN:
9780819489814
-
Pages:
686 (1 Vol) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Apr 2012 )