EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III

Item #:
044578
Our Price: $170.00
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Details

  • Title: Extreme Ultraviolet (EUV) Lithography III
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 13-16 February 2012, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 8322
  • Editor: Naulleau, Patrick P.
  • ISBN: 9780819489784
  • Pages: 970 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2012 )

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Tab 4

 
  • Title: Extreme Ultraviolet (EUV) Lithography III
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 13-16 February 2012, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 8322
  • Editor: Naulleau, Patrick P.
  • ISBN: 9780819489784
  • Pages: 970 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2012 )