PHOTOMASK TECHNOLOGY 2011

PHOTOMASK TECHNOLOGY 2011

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044422
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Details

  • Title: Photomask Technology 2011
  • Date/Location: Held 19-22 September 2011, Monterey, California, USA.
  • Series: Proceedings of SPIE Volume 8166
  • Editor: Maurer, Wilhelm
  • ISBN: 9780819487919
  • Pages: 1,094 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Oct 2011 )

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Tab 4

 
  • Title: Photomask Technology 2011
  • Date/Location: Held 19-22 September 2011, Monterey, California, USA.
  • Series: Proceedings of SPIE Volume 8166
  • Editor: Maurer, Wilhelm
  • ISBN: 9780819487919
  • Pages: 1,094 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Oct 2011 )