PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVIII

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVIII

Item #:
044337
Our Price: $70.00
Adding to cart… The item has been added

Details

  • Title: Photomask and Next-Generation Lithography Mask Technology XVIII
  • Date/Location: Held 13-15 April 2011, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 8081
  • Editor: Konishi, Toshio
  • ISBN: 9780819486738
  • Pages: 240 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2011 )

Description

 

Members/Attendees

 

Tab 4

 
  • Title: Photomask and Next-Generation Lithography Mask Technology XVIII
  • Date/Location: Held 13-15 April 2011, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 8081
  • Editor: Konishi, Toshio
  • ISBN: 9780819486738
  • Pages: 240 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Apr 2011 )