METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXV

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044227
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  • Title: Metrology, Inspection, and Process Control for Microlithography XXV
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 28 February - 3 March 2011, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 7971
  • Editor: Raymond, Christopher J.
  • ISBN: 9780819485304
  • Pages: 854 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Mar 2011 )

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  • Title: Metrology, Inspection, and Process Control for Microlithography XXV
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 28 February - 3 March 2011, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 7971
  • Editor: Raymond, Christopher J.
  • ISBN: 9780819485304
  • Pages: 854 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Mar 2011 )