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METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXV
- Item #:
- 044227
- UPC:
Details
-
Title:
Metrology, Inspection, and Process Control for Microlithography XXV
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 28 February - 3 March 2011, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 7971
-
Editor:
Raymond, Christopher J.
-
ISBN:
9780819485304
-
Pages:
854 (2 Vols) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Mar 2011 )
-
Title:
Metrology, Inspection, and Process Control for Microlithography XXV
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 28 February - 3 March 2011, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 7971
-
Editor:
Raymond, Christopher J.
-
ISBN:
9780819485304
-
Pages:
854 (2 Vols) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Mar 2011 )