EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY II

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY II

Item #:
044225
Our Price: $170.00
Adding to cart… The item has been added

Details

  • Title: Extreme Ultraviolet (EUV) Lithography II
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 28 February - 3 March 2011, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 7969
  • Editor: La Fontaine, Bruno
  • ISBN: 9780819485281
  • Pages: 1,040 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Mar 2011 )

Description

 

Members/Attendees

 

Tab 4

 
  • Title: Extreme Ultraviolet (EUV) Lithography II
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 28 February - 3 March 2011, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 7969
  • Editor: La Fontaine, Bruno
  • ISBN: 9780819485281
  • Pages: 1,040 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Mar 2011 )