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PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVII
- Item #:
- 044004
- UPC:
Details
-
Title:
Photomask and Next-Generation Lithography Mask Technology XVII
-
Date/Location:
Held 13-15 April 2010, Yokohama, Japan.
-
Series:
Proceedings of SPIE Volume 7748
-
Editor:
Hosono, Kunihiro
-
ISBN:
9780819482389
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Pages:
696 (1 Vol) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( May 2010 )
-
Title:
Photomask and Next-Generation Lithography Mask Technology XVII
-
Date/Location:
Held 13-15 April 2010, Yokohama, Japan.
-
Series:
Proceedings of SPIE Volume 7748
-
Editor:
Hosono, Kunihiro
-
ISBN:
9780819482389
-
Pages:
696 (1 Vol) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( May 2010 )