EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY

Item #:
043892
Our Price: $180.00
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Details

  • Title: Extreme Ultraviolet (EUV) Lithography
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 22-25 February 2010, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 7636
  • Editor: La Fontaine, Bruno
  • ISBN: 9780819480507
  • Pages: 1,064 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Mar 2010 )

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Tab 4

 
  • Title: Extreme Ultraviolet (EUV) Lithography
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 22-25 February 2010, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 7636
  • Editor: La Fontaine, Bruno
  • ISBN: 9780819480507
  • Pages: 1,064 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Mar 2010 )