PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVI

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVI

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043635
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Details

  • Title: Photomask and Next-Generation Lithography Mask Technology XVI
  • Date/Location: Held 8-10 April 2009, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 7379
  • Editor: Hosono, Kunihiro
  • ISBN: 9780819476562
  • Pages: 858 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( May 2009 )

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  • Title: Photomask and Next-Generation Lithography Mask Technology XVI
  • Date/Location: Held 8-10 April 2009, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 7379
  • Editor: Hosono, Kunihiro
  • ISBN: 9780819476562
  • Pages: 858 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( May 2009 )