ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVI

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVI

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  • Title: Advances in Resist Materials and Processing Technology XXVI
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 23-25 February 2009, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 7273
  • Editor: Henderson, Clifford L.
  • ISBN: 9780819475268
  • Pages: 1,334 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Mar 2009 )

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  • Title: Advances in Resist Materials and Processing Technology XXVI
  • Subtitle: At SPIE Advanced Lithography
  • Date/Location: Held 23-25 February 2009, San Jose, California, USA.
  • Series: Proceedings of SPIE Volume 7273
  • Editor: Henderson, Clifford L.
  • ISBN: 9780819475268
  • Pages: 1,334 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Mar 2009 )