PHOTOMASK TECHNOLOGY 2008

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043378
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Details

  • Title: Photomask Technology 2008
  • Date/Location: Held 7-10 October 2008, Monterey, California, USA.
  • Series: Proceedings of SPIE Volume 7122
  • Editor: Kawahira, Hiroichi
  • ISBN: 9780819473554
  • Pages: 1,382 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Oct 2008 )

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  • Title: Photomask Technology 2008
  • Date/Location: Held 7-10 October 2008, Monterey, California, USA.
  • Series: Proceedings of SPIE Volume 7122
  • Editor: Kawahira, Hiroichi
  • ISBN: 9780819473554
  • Pages: 1,382 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Oct 2008 )