PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV

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043284
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Details

  • Title: Photomask and Next-Generation Lithography Mask Technology XV
  • Date/Location: Held 16-18 April 2008, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 7028
  • Editor: Horiuchi, Toshiyuki
  • ISBN: 9780819472434
  • Pages: 1,122 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jun 2008 )

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  • Title: Photomask and Next-Generation Lithography Mask Technology XV
  • Date/Location: Held 16-18 April 2008, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 7028
  • Editor: Horiuchi, Toshiyuki
  • ISBN: 9780819472434
  • Pages: 1,122 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Jun 2008 )