PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIV

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIV

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042879
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  • Title: Photomask and Next-Generation Lithography Mask Technology XIV
  • Date/Location: Held 17-19 April 2007, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 6607
  • Editor: Watanabe, Hidehiro
  • ISBN: 9780819467454
  • Pages: 1,028 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( May 2007 )

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  • Title: Photomask and Next-Generation Lithography Mask Technology XIV
  • Date/Location: Held 17-19 April 2007, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 6607
  • Editor: Watanabe, Hidehiro
  • ISBN: 9780819467454
  • Pages: 1,028 (2 Vols) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( May 2007 )