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ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV
- Item #:
- 042806
- UPC:
Details
-
Title:
Advances in Resist Materials and Processing Technology XXIV
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 26-28 February 2007, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 6519
-
Editor:
Lin, Qinghuang
-
ISBN:
9780819466389
-
Pages:
1,348 (2 Vols) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Mar 2007 )
-
Title:
Advances in Resist Materials and Processing Technology XXIV
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 26-28 February 2007, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 6519
-
Editor:
Lin, Qinghuang
-
ISBN:
9780819466389
-
Pages:
1,348 (2 Vols) (approx)
-
Format:
Softcover
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Mar 2007 )