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NOVEL PATTERNING TECHNOLOGIES FOR SEMICONDUCTORS, MEMS/NEMS AND MOEMS 2020
- Item #:
- 054281
- UPC:
Details
-
Title:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 24-27 February 2020, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 11324
-
Editor:
Sanchez, Martha I.
-
ISBN:
9781510634152
-
Pages:
238 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Jun 2020 )
-
Title:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 24-27 February 2020, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 11324
-
Editor:
Sanchez, Martha I.
-
ISBN:
9781510634152
-
Pages:
238 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Jun 2020 )