Skip to main content
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI
- Item #:
- 054280
- UPC:
Details
-
Title:
Extreme Ultraviolet (EUV) Lithography XI
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 24-27 February 2020, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 11323
-
Editor:
Felix, Nelson M.
-
ISBN:
9781510634138
-
Pages:
494 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Jun 2020 )
-
Title:
Extreme Ultraviolet (EUV) Lithography XI
-
Subtitle:
At SPIE Advanced Lithography
-
Date/Location:
Held 24-27 February 2020, San Jose, California, USA.
-
Series:
Proceedings of SPIE Volume 11323
-
Editor:
Felix, Nelson M.
-
ISBN:
9781510634138
-
Pages:
494 (1 Vol)
-
Format:
Softcover
-
TOC Link:
View Table of Contents
-
Publisher:
SPIE - International Society for Optics and Photonics
-
POD Publisher:
Curran Associates, Inc. ( Jun 2020 )