PHOTOMASK JAPAN 2017: XXIV SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY

PHOTOMASK JAPAN 2017: XXIV SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY

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046636
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Details

  • Title: Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
  • Date/Location: Held 5-7 April 2017, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 10454
  • Editor: Takehisa, Kiwamu
  • ISBN: 9781510613898
  • Pages: 264 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Aug 2017 )

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  • Title: Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
  • Date/Location: Held 5-7 April 2017, Yokohama, Japan.
  • Series: Proceedings of SPIE Volume 10454
  • Editor: Takehisa, Kiwamu
  • ISBN: 9781510613898
  • Pages: 264 (1 Vol) (approx)
  • Format: Softcover
  • Publisher: SPIE - International Society for Optics and Photonics
  • POD Publisher: Curran Associates, Inc. ( Aug 2017 )